Method and system for focusing a charged particle beam

ABSTRACT

A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample and collecting a first set of detection signals; (b) altering a focal point of a charged particle bean according to a second focal pattern while scanning a second area that is ideally identical to the first area and collecting a second set of detection signals; and (c) processing the first and second set of detection signals to determine a focal characteristic; whereas the first focal pattern and the second focal pattern differ by the location of an optimal focal point.

RELATED APPLICATION

This application is a Divisional Application of U.S. application Ser.No. 11/155,044 filed Jun. 17, 2005, which is related to and claims thepriority benefit of U.S. Provisional Application 60/581,854, filed Jun.21, 2004, incorporated herein by reference.

FIELD OF THE INVENTION

This invention relates to a charged particle system and a method forfocusing a charged particle beam.

BACKGROUND OF THE INVENTION

Modern inspection, defect review and metrology tools use one or morecharges particle beams in order to inspect, analyze and measure featuresor defects. The resolution of these systems is responsive to variousparameters including the focus error, astigmatism and the like. Modernsystems are also required to inspect, review or measure samples with anincreased throughput. High throughput systems requires fast focus errordetection methods.

As the size of features and defects gets smaller there is a need toprovide an efficient method for determining focus errors.

SUMMARY OF THE INVENTION

A method for focusing a charged particle beam, the method includes: (a)altering a focal point of a charged particle beam according to a firstfocal pattern while scanning a first area of a sample and collecting afirst set of detection signals; (b) altering a focal point of a chargedparticle beam according to a second focal pattern while scanning asecond area that is ideally identical to the first area and collecting asecond set of detection signals; and (c) processing the first and secondset of detection signals to determine a focal characteristic; whereasthe first focal pattern and the second focal pattern differ by thelocation of an optimal focal point.

Conveniently, the method can include applying the first and or secondfocal patterns during inspection sessions or between inspectionsessions.

A system that includes: (i) illumination optics, adapted to alter afocal point of a charged particle beam according to a first focalpattern while scanning a first area of a sample; and adapted to alter afocal point of a charged particle beam according to a second focalpattern while scanning a second area that is ideally identical to thefirst area; (ii) at least one detector adapted to provide a first set ofdetection signals resulting from the scanning of the first area andadapted to provide a second set of detection signals resulting from thescanning of the second area; and (iii) a processor, adapted to processthe first and second set of detection signals to determine a focalcharacteristic, whereas the first focal pattern and the second focalpattern differ by the location of an optimal focal point.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to understand the invention and to see how it may be carriedout in practice, a preferred embodiment will now be described, by way ofnon-limiting example only, with reference to the accompanying drawings,in which:

FIG. 1 illustrates a portion of a system for sample inspection,according to an embodiment of the invention;

FIG. 2 illustrates a first focal pattern and a second focal pattern,according to an embodiment of the invention;

FIG. 3 illustrates the relationship between the focus grades associatedwith the first and second curves of FIG. 1;

FIG. 4 illustrates a focal pattern that is responsive to focal mapping,according to an embodiment of the invention;

FIG. 5 illustrates a sinusoidal focal pattern and a linear mappingpattern, according to an embodiment of the invention;

FIG. 6 includes a timing diagram illustrates the timing of aninspections periods and few short focus correction sessions are appliedbetween;

FIG. 7 is a flow chart illustrating a method for focusing a chargedparticle beam, according to an embodiment of the invention,

DETAILED DESCRIPTION OF THE DRAWINGS

In the following detailed description of the preferred embodiments andother embodiments of the invention, reference is made to theaccompanying drawings. It is to be understood that those of skill in theart will readily see other embodiments and changes may be made withoutdeparting from the scope of the invention.

According to various embodiments of the invention focal characteristicscan be determines by applying one, two or more focal patterns. Somefigures refer to a first and second focal pattern but the amount offocal patterns can vary. The two focal patterns can be a part of thesame focal pattern.

According to an embodiment of the invention the focus can be changeaccording to a focus pattern such as to enable to detect focus errors.The focus pattern can include small deviations from proper focus butthis is not necessarily so.

The focus pattern can include large or moderate deviations from properfocus. According to an embodiment of the invention the focus pattern canbe applied in a manner that allows to inspect areas that are imagedwhile focus changes occur, but this is not necessarily so. The localchanges can occur during an inspection stage of a sample but this notnecessarily so.

According to an embodiment of the invention the focus can be fixedduring a scan of a certain sub-area or strip, while the focal pointchanges between different sub-areas of strips.

The focus pattern is applied while a certain region is scanned. The sizeof that region change from sample to sample, from scan to scan, fromarea to area.

According to an embodiment of the invention one or more characteristicof the focal pattern can be determined in response to focal errors thatwere previously detected, to the pattern or shape of the scanned sample,and the like.

Conveniently, the focus is changed along an imaginary first axis whilethe sample is translated along an traverse (conveniently perpendicular)axis. This is not necessarily so. The method can be applied in systemswhere the sample is stationary and a part of the inspection systemmoves. According to another embodiment of the invention the method canbe applied while a rotational displacement is introduced between thesample and the inspection system.

Conveniently, the method includes collecting scattered charged particlebeams from a sample, but this is not necessarily so.

The following figures refer to an inspection system. It is noted thatthe invention can be applied in other systems such as but not limited tometrology systems, review systems and the like.

The inventors inspected a wafer but other samples, such as but notlimited to reticles can be scanned. It is further noted that theinvention can be applied to transmissive inspection systems.

FIG. 1 illustrates portion 10 of an inspection system, according to anembodiment of the invention. It is noted that various prior art chargedparticle beam devices, including devices that utilize one or morecharged particle beams, can be used for applying the invention.

It is noted that such a prior art system has to be able to perform fastalteration of the focus point, and to be able to process the detectionssignals according to various embodiments of the invention. A fast focusalteration can be applied various times during a single scan of a sliceof a sample. Conveniently, fast scan changes should not exceed a rate of1 cm/sec.

Portion 10 includes many components. Some components are optional. Theportion includes illumination optics an inspection optics. Theillumination optics generate and direct a charged particle beam towardsthe sample. The focal point of the charges particle beam can be alteredby various components of the illumination optics. The term “optics”includes components such as objective lenses, magnetic coils,polepieces, electrostatic lenses, apertures, scanners, and the like.These components affect various characteristics of the charged particlebeam. The optics can also include the components such as powersuppliers, current supply sources, components that control thesecomponents and the like.

The illumination path includes a charged particle beam source 11. Thesource 11 usually includes an electron gun, a filament, a suppressor, anextractor and an anode. The charged particle beam source 11 is followedby a upper octupole 12, aperture alignment coils 13, beam definingaperture 14, blanker 15, differential vacuum aperture 16, an upper groupof coils 17, a blanking aperture 19, a lower group of coils 20, a loweroctapule 21 and a magnetic objective lens 22. The charged particle beamcan also be diverted to a Farady cup 18.

The inspection path includes the magnetic objective lens 22, the loweroctapule 21, the lower group of coils 20, beam bending electrodes 24, anelectrostatic quadrapule 26, an electrostatic focus lens 28, a groundedaperture 30, an electrostatic filter 32 and a detector 34.

Various components of portion 10 receive high voltage supply from a highvoltage module 40. Various components, and especially magneticcomponents receive current from a current supply module 42.

The focal points of the charged particle beam can be changed (modulated)by various components of the illumination path such as the upper andlower group of coils 17 and 20, the upper and lower octupoles 12 and 21.Fine focal point changes are usually achieved by the octupoles.

Typically, the inspection system also includes a stage, imageprocessors, a vacuum chamber, optical components, man machine interfaceand the like. The charged particle beam propagates through vacuum.

FIG. 2 illustrates a first focal pattern 110 and a second focal pattern120 according to an embodiment of the invention.

FIG. 2 illustrates ideal focal patterns that ignore various inaccuraciesin the sample or in the scanning process. It is noted that the distancebetween the sample and the optics of the charged particle beam canchange during the scanning of the sample due to various results such ascurvature sample surface, stage inaccuracies and the like.

Conveniently, a focal pattern that is applied during a scanning processis also responsive to the various sample and inspection systeminaccuracies and deviations.

Due to various reasons, including sample manufacturing inaccuracies,inspection system mechanical inaccuracies (such as stage curvature) thedistance between the sample and the inspecting system optics changes.When using high-resolution inspection even sub-micron height changes canaffect the focus. Typically, in order to adjust the focus these changesa preliminary mapping of the sample (as being conveyed by the stage ofthe inspection system) takes place. Although this map reflects bothsample and inspection system deviations this map is referred to as asample map.

This preliminary mapping is relatively accurate and time consuming. Aset of mapping locations of the sample is selected. In each mappinglocation a charged particle beam is directed towards the sample and isinspected, while altering the focal point changes, in order to locatethe optimal focal point. After the focal point is found the focal pointof the various mapping locations are processed (for example byextrapolation) in order to provide a map of focal changes. It is notedthat various prior art method for performing mapping can be applied,including fringe base methods and the like.

Conveniently, one or more “general” focal patterns, such as focalpatterns 110 and 120, are determined. These “general” focal patterns areadjusted according to the mapping of each sample, to provide a uniquefocal pattern that can be applied while a certain sample is scanned.

Once such a mapping is achieved the focal pattern that is applied duringthe focus correction sequence is responsive to the mapping and to thementioned above focal patterns.

FIG. 2 illustrates the change of focal point (represented by a controlsignal that controls the focal point of the system) while the chargedparticle beam is scanned along an imaginary Y axis. It is noted thatduring this scan the sample is usually moved along an imaginary X axis.It is noted that more than a single control signal can be used in orderto provide the desired focal pattern.

Both focal patterns 110 and 120 are sloped lines that differ from eachother by the optimal focal point. The optimal focal point istheoretically located at the crossing between a curve and the horizontalaxis.

FIG. 3 illustrates the relationship between focus grades associated withthe first and second curves 110 and 120 of FIG. 1.

The focal grade reflects deviations from an optimal focal point,assuming that a focal pattern such as focal pattern 110 and focalpatterns 120 are applied. Curve 130 illustrates the focal grade achievedfrom applying the first focal pattern 110 and curve 140 illustrates thefocal grade achieved from applying the second focal pattern. It is notedthat the focal grade differs as a result of the known difference betweenthe focal pattern and also as a result of the unknown focus differencebetween the scanning of the first and second area. This unknown focaldifference has to be found.

Conveniently, two focus grades are generated from each focal pattern.

The focal grade is responsive to the square of the focal error and issymmetrical in relation to the optimal focal point. Accordingly, curve130 and curve 140 have a parabolic shape.

The horizontal displacement between the two parabolas is responsive tothe shift between the first and second focal patterns and to the unknownfocus difference between the scans. The horizontal displacement ismeasured and used to determine the focus correction signal. Assumingthat: (a) the optimal focal point is located at point where these twoparabolas cross each other and, (b) an optimal focal point of each curveis located at the parabola center (or minimum), then the optimal focalpoint can be found by: (i) finding the minimal point of one parabola andstoring the corresponding height value (Z min1), (ii) determining thehorizontal displacement between the parabolas (ΔZ), and (iii) eitheradding (from the minimum of curve 130) or subtracting (from the minimumof curve 140) half of the horizontal displacement to or from the minimalpoint.

Typical illumination path components introduce aberrations, thus thelocation of the focal point differs along the Y axis and along the Xaxis. In order to determine the proper focal points the method generatestwo gradient images—one along the x-axis and another long the Y axis.

FIG. 4 illustrates a focal pattern 160 that is responsive to a mappingof a sample, according to an embodiment of the invention.

As previously mentioned focal patterns are adjusted according to themapping of a sample.

First focal pattern 160 is a superposition of a linear mapping curve 150that represent a linear portion of the sample mapping and of firstlinear curve 130.

The first focal pattern includes large deviations from the optimalfocus. In order to prevent large gaps in the coverage of a scannedsample the first focal pattern is relatively short and steep. Thus, onlya small area of the sample is scanned out of focus.

According to another embodiment of the invention the focal patternincludes minor height changes. These minor changes do not prevent theacquisition of images from the sample, thus then can be implementedduring the inspection phase, without forming gaps in the image.Conveniently, these changes can be applied over large areas of thesample, but this is not necessarily so.

The inventors users a sinusoidal focal pattern that included relativelysmall focus deviations. This sinusoidal pattern was added to a map ofthe sample.

FIG. 5 illustrates a sinusoidal focal pattern 170 and a linear mappingpattern 180, according to an embodiment of the invention.

The actual focal pattern 190 is a superposition of both patterns.

FIG. 6 includes a timing diagram 200 illustrates the timing ofinspection periods and short focus correction periods according to anembodiment of the invention.

For convenience of explanation timing diagram 200 illustrates fourinspection periods (IP1-IP4 211-214) and three focus correction periods(FC1-FC3 221-223), but the number of periods can change. It is alsonoted that the length of each period can differ from the other.Conveniently the inspection periods are longer and even much longer thanthe focus correction periods.

The inspection periods and the focus correction period are interlaced.Each focus correction period is timed between two inspection periods.The first, second and third inspection periods IP1-IP3 211-214 arefollowed by the first, second and third focus correction periods FC1-FC3221-223 accordingly. IP1, FC1, IP2, FC2, IP3, FC3 and IP4 start at timesT1, T2, T3, T4, T5 and T6. IP4 ends at T7.

It is assumed that at T1 mapping of the sample is completed.

During the first inspection period IP1 211 the focus is alteredaccording to the sample mapping and a first portion of the sample isimaged.

The focus alterations can also be responsive to pervious focuscorrection periods, for example of focus correction periods that wereapplied during pervious scans of the sample, scans of other stripes ofthe sample and the like.

During each focus correction period (FC1-FC3) the focus is changedaccording to a focal pattern that can be responsive to the mapping ofthe sample and also allows to correct focus. Conveniently, each focalpattern includes under-focus points as well as over-focus points.

The focus during each of inspection periods IP2-IP4 is responsive to themapping of the sample but is also responsive to the results of thepreceding focus correction period. Conveniently, before such aninspection period starts (or immediately after such a period begins) thefocus is corrected in response to the results of the pervious focuscorrection period.

FIG. 7 is a flow chart illustrating a method 300 for focusing a chargedparticle beam, according to an embodiment of the invention.

Method 300 starts by stage 310 of mapping an upper surface of thesample.

Stage 310 is followed by stage 320 of altering a focal point of acharged particle beam according to a first focal pattern while scanninga first area of a sample and collecting a first set of detectionsignals. The first set of detection signals can form an image of berepresentative of an image of the scanned first area. Conveniently, theimage of the first area is denoted I₁(i,j).

Conveniently, the first focal pattern includes under-focus points andover-focused points.

Stage 320 is followed by stage 330 of altering a focal point of acharged particle beam according to a second focal pattern while scanninga second area that is ideally identical to the first area and collectinga second set of detection signals. The second set of detection signalscan form an image of be representative of an image of the scanned secondarea. Conveniently, the image of the second area is denoted I₂(i,j).

According to an embodiment of the invention the altering includes amechanical translation. Conveniently, the alteration can include analteration of a characteristic of an illumination path through which thecharged particle beam propagates. Conveniently, the altering isresponsive to an estimated distance between at least one element of acharged beam device and between the surface of the sample.

Conveniently, stages 320 and 330 are repeated various times, during theimaging of the sample. It is noted that during each repetition a newimage is acquired. Conveniently, stages 320 and 330 are also repeatedsuch as to collect a third set of detection signals from a third areathat is ideally identical to the first area; and wherein the processingfurther includes processing the third set of detection signals.

Conveniently, method 300 also includes scanning a reference area that isideally identical to the first area while maintaining a substantialconstant focal point to collect a reference set of detection signals;and wherein the processing further includes processing the reference setof detection signals.

Conveniently, the first area includes multiple non-continuous segments.Conveniently, the area includes multiple segments and the focal point ismaintained substantially fixed in relation to a surface of the samplewhile scanning a single segment.

According to various embodiments of the invention the focal pattern canhave many shapes. It can be continuous or non-continuous. Conveniently,the shape of the focal pattern is determined in response to theinspection system characteristics and especially to the response time ofthe focal changing elements. The inventors used ramp shaped focalpatterns and sinusoidal shaped focal patterns but other shapes as wellas combination of various shapes can be used.

Conveniently, stages 320 and 330 are executed during an inspectionsession of the wafer. According an embodiment of the invention the firstfocal pattern is applied during an inspection session of the sample.Conveniently, the first focal pattern is applied during focal correctionsessions between inspection sessions of the sample.

According to an embodiment of the invention the first area includes afirst group of sub-areas and wherein the second area includes a secondgroup of sub-areas. Conveniently, the processing includes processingdetection signals from each sub-area to provide a sub-area grade anddetermining the focus characteristic in response to the grades of eachsub-area.

Stage 330 is followed by stage 340 of processing the first and secondset of detection signals to determine a focal characteristic; whereasthe first focal pattern and the second focal pattern differ by thelocation of an optimal focal point.

According to an embodiment of the invention stage 340 includesestimating a focal change along a first axis (such as an imaginary Yaxis) and along a second traverse axis (such as an imaginary X axis).Conveniently, the focal characteristic is determined in response to thefocal change along a first axis and in response to a focal change alongthe second axis. Conveniently, stage 430 involves generating twogradient images of the first area and a two gradient image of the secondarea.

Conveniently, stage 340 includes: (i) generating a first axis gradientimage of area; (ii) generating a second axis gradient image of the firstarea; (iii) calculating a focal grade of the first axis gradient imageof the first area; and (iv) calculating a focal grade of the second axisgradient image of the first area.

Conveniently, stage 340 includes: (i) generating a first axis gradientimage of the second area; (ii) generating a second axis gradient imageof the second area; (iii) calculating a focal grade of the first axisgradient image of the second area; (iv) calculating a focal grade of thesecond axis gradient image of the second area; (v) comparing between thefocal grade of the first axis gradient image of the first area andbetween focal grade of the first axis gradient image of the second area;and (vi) comparing between the focal grade of the second axis gradientimage of the first area and between focal grade of the second axisgradient image of the second area.

Assuming that the gradient images are denoted G_(x1), G_(x2), G_(y1) andG_(y2), that the focus grades are calculated per line and are denotedFocusGrade_(x1)(line_j), FocusGrade_(x2)(line_j),FocusGrade_(y1)(line_j) and FocusGrade_(y2)(line_j) then the followingmathematical terms represent the first stages of the mentioned aboveprocesses:${{G_{x\quad 1}\left( {i,j} \right)} = \frac{\vartheta\quad{I_{1}\left( {i,j} \right)}}{\vartheta\quad x}},{{G_{y\quad 1}\left( {i,j} \right)} = \frac{\vartheta\quad{I_{1}\left( {i,j} \right)}}{\vartheta\quad y}}$${{G_{x\quad 2}\left( {i,j} \right)} = \frac{\vartheta\quad{I_{2}\left( {i,j} \right)}}{\vartheta\quad x}},{{G_{y\quad 2}\left( {i,j} \right)} = \frac{\vartheta\quad{I_{2}\left( {i,j} \right)}}{\vartheta\quad y}}$${{FocusGrade}_{x\quad 1}({line\_ j})} = {\sum\limits_{j}{{G_{x\quad 1}\left( {i,j} \right)}}^{2}}$${{FocusGrade}_{y\quad 1}({line\_ j})} = {\sum\limits_{j}{{G_{y\quad 1}\left( {i,j} \right)}}^{2}}$${{FocusGrade}_{x\quad 2}({line\_ j})} = {\sum\limits_{j}{{G_{x\quad 2}\left( {i,j} \right)}}^{2}}$${{FocusGrade}_{y\quad 2}({line\_ j})} = {\sum\limits_{j}{{G_{y\quad 2}\left( {i,j} \right)}}^{2}}$

The focus grade of a certain line is proportional to the focus grade atthe best focus point and to the square of the height deviation from that

According to an embodiment of the invention the method can be applied ona sample that includes multiple repetitive patterns (cells). A firstfocal pattern can be applied while scanning a first group of repetitivepatterns (cells) and a second focal pattern can be applied whilescanning a second group of repetitive patterns (cells). In such a casethe previously stages can be applied but according to another embodimentof the invention instead of selecting the best line in a image themethod can select the best cell. The focus error can be calculated bycomparing the location of the best cells.

The present invention can be practiced by employing conventional tools,methodolgy and components. Accordingly, the details of such tools,component and methodology are not set forth herein in detail. In theprevious descriptions, numerous specific details are set forth, such asshapes of test structures and materials that are electro-opticallyactive, in order to provide a thorough understanding of the presentinvention. However, it should be recognized that the present inventionmight be practiced without resorting to the details specifically setforth.

Only exemplary embodiments of the present invention and but a fewexamples of its versatility are shown and described in the presentdisclosure. It is to be understood that the present invention is capableof use in various other combinations and environments and is capable ofchanges or modifications within the scope of the inventive concept asexpressed herein.

1. An inspection system, comprises: (i) illumination optics, adapted toalter a focal point of a charged particle beam according to a firstfocal pattern while scanning a first area of a sample, and adapted toalter a focal point of a charged particle beam according to a secondfocal pattern while scanning a second area that is ideally identical tothe first area; (ii) at least one detector adapted to provide a firstset of detection signals resulting from the scanning of the first areaand adapted to provide a second set of detection signals resulting fromthe scanning of the second area; and (c) a processor, adapted to processthe first and second set of detection signals to determine a focalcharacteristic; whereas the first focal pattern and the second focalpattern differ by the location of an optimal focal point.
 2. The systemaccording to claim 1 wherein the first focal pattern comprisesunder-focus points and over-focused points.
 3. The system according toclaim 1 further adapted to repeat stages (a) and (b) such as to collecta third set of detection signals from a third area that is ideallyidentical to the first area; and wherein the processing furthercomprises processing the third set of detection signals.
 4. The systemaccording to claim 1 further adapted to scan a reference area that isideally identical to the first area while maintaining a substantialconstant focal point to collect a reference set of detection signals;and wherein the processor is further adapted to process the referenceset of detection signals.
 5. The system according to claim 1 wherein theprocessor estimates a focal change along a first axis and along a secondtraverse axis.
 6. The system according to claim 5 wherein the focalcharacteristic is determined in response to the focal change along afirst axis and in response to a focal change along the second axis. 7.The system according to claim 1 wherein the processor generates agradient image of the first area and a gradient image of the secondarea.
 8. The system according to claim 1 wherein the alterationcomprises a mechanical translation.
 9. The system according to claim 1wherein the alteration comprises an alteration of a characteristic of anillumination path through which the charged particle beam propagates.10. The system according to claim 1 wherein the alteration is responsiveto an estimated spatial relationship between at least one element of acharged beam device and between the surface of the sample.
 11. Thesystem according to claim 1 further adapted to map an upper surface ofthe sample.
 12. The system according to claim 1 wherein the first areacomprises multiple non-continuous segments.
 13. The system according toclaim 1 wherein the area comprises multiple segments and wherein thefocal point is maintained substantially fixed in relation to a surfaceof the sample while scanning a single segment.
 14. The system accordingto claim 1 wherein the processor is adapted to: generate a first axisgradient image of the first area, generate a second axis gradient imageof the first area; calculate a focal grade of the first axis gradientimage of the first area; and calculate a focal grade of the second axisgradient image of the first area.
 15. The system according to claim 14wherein the processor is adapted to: generate a first axis gradientimage of the second area; generate a second axis gradient image of thesecond area; calculate a focal grade of the first axis gradient image ofthe second area; calculate a local grade of the second axis gradientimage of the second area; compare between the focal grade of the firstaxis gradient image of the first area and between focal grade of thefirst axis gradient image of the second area; and compare between thefocal grade of the second axis gradient image of the first area andbetween focal grade of the second axis gradient image of the secondarea.
 16. The system according to claim 1 wherein the focal patterncomprises a ramp.
 17. The system according to claim 1 wherein the focalpattern comprises limited focal changes.
 18. The system according toclaim 1 adapted to alter the focal point during an inspection session ofthe sample.
 19. The system according to claim 1 wherein system isadapted to apply the first focal pattern during an inspection session ofthe sample.
 20. The system according to claim 1 wherein the system isadapted to apply the first focal pattern during focal correctionsessions between inspection sessions of the sample.
 21. The systemaccording to claim 1 wherein the first area comprises a first group ofsub-areas and wherein the second area comprises a second group ofsub-areas.
 22. The system according to claim 1 wherein the processingcomprises processing detection signals from each sub-area to provide asub-area grade and determining the focus characteristic in response tothe grades of each sub-area.